The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2002

Filed:

Jan. 27, 2000
Applicant:
Inventors:

Ferencz S. Denes, Madison, WI (US);

Sorin O. Manolache, Madison, WI (US);

Majid Sarmadi, Madison, WI (US);

Raymond A. Young, Madison, WI (US);

Ramaswami Ganapathy, Madison, WI (US);

Alvaro de Jesus Martinez-Gomez, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 1/908 ;
U.S. Cl.
CPC ...
B01J 1/908 ;
Abstract

A wide variety of substrates can be functionalized to attach spacer molecules therein by exposing the substrates to a cold plasma ignited in dichlorosilane, silicon tetrachloride or hexachlorodisilane gas to implant silicon-chlorine functionalities in the substrate surface. The plasma implanted surface functionalities can then be utilized to initiate second stage gas phase derivatization reactions to form linker molecules attached to the substrate. Active biomolecules such as enzymes can then be bound to the exposed linker molecules to bind the bioactive molecules to the substrate while allowing freedom of movement and conformation of the bound molecule comparable to that of the free molecule.


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