The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2002
Filed:
Sep. 21, 2000
Applicant:
Inventors:
Neal T. Murphy, Richardson, TX (US);
Claire Ching-Shan Jung, Plano, TX (US);
Danny F. Mathews, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method for resist strip and metal contamination removal. Wafers ( ) with a patterned resist formed thereon are subjected to an ozonated deionized water solution, such as mist ( ). The ozonated deionized water solution ( ) strips the resist and removes the resist residue. At the end of the process, HCl ( ) is added to the deionized water ( ) prior to forming the ozonated deionized water solution ( ) to remove metal contaminants.