The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2002
Filed:
Jun. 14, 2000
Applicant:
Inventors:
Rüdiger Arens-Fischer, Reutlingen, DE;
Michael Berger, Wachtberg, DE;
Michael Krüger, Tübingen, DE;
Markus Thönissen, Nettetal, DE;
Hans Lüth, Aachen, DE;
Assignee:
Forschungszentrum Julich GmbH, Julich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F 3/00 ;
U.S. Cl.
CPC ...
C25F 3/00 ;
Abstract
A porous layer produced from silicon, germanium or aluminum by applying a wedge-shaped mask to the surface of the layer and by controlled elecrochemical etching along the mask.
Arens-Fischer, Rüdiger. (2002). Process for producing a porous layer by an electrochemical etching process (U.S. Patent No. 6398943). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6398943
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile