The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Sep. 20, 2000
Applicant:
Inventors:
Robert S. Rejewski, Brockport, NY (US);
Edward M. Eck, Lima, NY (US);
Assignee:
Heidelberger Druckmaschinen AG, Heidelberg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 1/502 ;
U.S. Cl.
CPC ...
G03G 1/502 ;
Abstract
A method for reducing contamination of a corona charger in an electrophotographic process wherein the corona charger imparts a charge to a photoconductor film passed by the corona charger, by identifying contaminated air flow streams and determining the direction of flow of the contaminated air flow stream flowing past or into the corona charger and positioning at least one plate to divert the contaminated air flow streams away from the corona charger.
Rejewski, Robert. (2002). Method and system for reducing contamination of a corona charger (U.S. Patent No. 6397024). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6397024
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile