The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Oct. 30, 2000
Scott H. Goodwin-Johansson, Pittsboro, NC (US);
MCNC, Research Triangle Park, NC (US);
Abstract
An electromagnetic radiation shutter device driven by electrostatic forces comprises a stationary membrane capable of allowing electromagnetic radiation transmission therethrough, and a first and second flexible membrane comprising an electrode element and at least one biasing element. The first flexible membrane has a fixed portion attached to the underside of the stationary membrane and a distal portion adjacent to the fixed portion and released from the underside of the stationary membrane. The second flexible membrane has a fixed portion attached to the topside of the stationary membrane and a distal portion adjacent to the fixed portion and released from the topside of the stationary membrane. In operation, a voltage differential is established between the electrode element of the first flexible membrane and the electrode element of the second flexible membrane thereby moving the first and second flexible membranes relative to the stationary membrane. In a closed state (i.e. fully activated), the flexible membranes will be generally parallel to the stationary membrane and will be capable of deflecting electromagnetic radiation. In an open state (i.e. no voltage applied), the flexible membranes will generally be fully curled based on biasing in the flexible membranes induced during fabrication and/or imparted by material characteristics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile