The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Jan. 29, 2001
Sandra S. Zheng, Plano, TX (US);
Cindy Pan, Allen, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method for testing the image displacement of a reticle following a change in illumination comprising the steps of taking a first image displacement measurement with a test reticle ( ) having a variable linewidth (L) and a variable pitch size (s) on an image displacement mark ( ), changing the illumination conditions of the photolithographic equipment and taking a second image displacement measurement with the test reticle ( ) to determine an image displacement offset due to changes in illumination, is disclosed.
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