The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Jan. 20, 1999
Kenji Nishi, Yokohama, JP;
Shinji Wakamoto, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate. The apparatus further has an adjusting device for adjusting at least one of the scanning speeds of the mask and substrate, the intensity of the light beam to be incident on the photosensitive substrate and the width of a projection area of the pattern of the mask by the projection optical system in the relative scanning direction in accordance with the change of the sensitivity characteristic of the photosensitive substrate or the change of the intensity distribution of the light beam passing a Fourier transform plane in the illumination optical system with respect to the pattern surface of the mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile