The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2002

Filed:

Jun. 27, 2000
Applicant:
Inventors:

Steven J. Cowen, San Diego, CA (US);

Michael A. Kagan, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract

A photo-lithographic mask includes a flexible, optically transparent body having an optically transmissive first surface for receiving an optical signal, and a second surface opposite the first surface having grooves for internally reflecting first portions of the optical signal and for allowing second portions of the optical signal to be transmitted through the second surface when the second surface is pressed against a wafer. The body consists essentially of silicone. The grooves have a saw tooth profile that are configured at an angle that exceeds the critical angle of the silicone with respect to the direction of the incoming optical signal.


Find Patent Forward Citations

Loading…