The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2002

Filed:

Oct. 21, 1999
Applicant:
Inventors:

Stanley Desjardins, Tempe, AZ (US);

Gary Brown, Gilbert, AZ (US);

Assignee:

Simula, Inc., Phoenix, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16F 7/12 ;
U.S. Cl.
CPC ...
F16F 7/12 ;
Abstract

A simple, low cost energy absorbing shear strip bender that provides constant load, tailored load, or adjustable load/displacement profiles for use in any application where a single use energy absorber is required. Examples include, but are not limited to: a spinal load attenuator for use in crash-resistant aircraft seats; crash-resistant aircraft landing gear; aircraft or automotive restraint harness attachments; cargo or high-mass item tie-downs; automotive bumper attachments; and collapsible steering columns. The present invention comprises a shear plate or other base material, a shear strip integral to the shear plate, and a shear strip tab, all of which are formed from a single sheet of ductile material. The energy absorber attaches to two objects and begins to displace when opposing forces applied to the shear plate and shear strip tab reach the design limit value such that shear strip shears and plastically deforms, i.e., bends. The load that must be applied to stroke the energy absorber is the sum of the shearing force and the bending force. The direction of motion is generally parallel to the shearing plate, but may deviate from parallel by as much as 90°.


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