The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Oct. 19, 1999
Manfred Krauss, Jena, DE;
Hans-Georg Krolla, Mainz, DE;
Eckart Hussmann, Ober-Olm, DE;
Bernhard R. Durschang, Würzburg, DE;
Gerd Muller, Würzburg, DE;
Other;
Abstract
The present invention relates to a novel process for the production of sequences of interference layers composed of layers i of prescribed thicknesses d(i) and refractive indices n(i). In this process a stack of at least two layers i of glasses having refractive indices n(i) and thicknesses d (i), which are each larger than the predetermined thicknesses d(i) by the same multiplying factor, is provided. The stack is heated to a temperature above the transformation temperature of the glasses and during or after heating, the stack is drawn in such a manner that the individual layers obtain the prescribed thicknesses d(i). After this the drawn stack is cooled.