The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Dec. 30, 1999
Futoshi Mori, Tokyo, JP;
Masato Takahashi, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A projection exposure apparatus transferring a pattern from a reticle to a wafer includes at least three vibration isolating pads, a vibration isolating stand on the vibration stand, a plurality of actuators driving the vibration isolating stand in a vertical direction, at least two stages over the vibration isolating stand, the stages mounting the wafer and the reticle, at least one displacement sensor at the vibration isolating stand and detecting a displacement of the vibration isolating stand, at least one acceleration sensor at the vibration isolating stand and detecting an acceleration and deceleration of the vibration isolating stand, a vibration control system coupled to the displacement sensors and the acceleration sensors, and controlling the actuators based on outputs of the displacement sensors and the acceleration sensor, a position measuring device positioned on the vibration isolating pads and measuring a position of the stages, and a vibration compensating system coupled to the vibration control system and receiving a command value to cancel a reaction force caused by the acceleration and deceleration of the stages in advance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile