The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Aug. 18, 1999
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
Stable operation of an ion beam deposition (IBD) station forming part of a multi-station apparatus and formation therein of a tribologically robust DLC-type i-C:H ultra-thin protective overcoat for high recording density magnetic media are achieved by pulsing (i.e., limiting) the flow of a hydrocarbon source gas to the ion beam source to deposition intervals between substrate transfer/pressure cycling. Embodiments include utilizing a circularly-shaped, closed drift, end Hall type ion beam source as part of a multi-process station apparatus, wherein undesirable arcing of the ion beam source during substrate transfer is eliminated, or at least substantially reduced, as a result of the pulsed supply of hydrocarbon source gas to the ion beam source.