The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Nov. 12, 1999
Randy D. Redd, Chandler, AZ (US);
Lawrence S. Klingbeil, Chandler, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method for patterning a substrate having a surface with high aspect ratio topography with a photoresist is described. Specifically the surface of a semiconductor substrate is pre-wetted with a solvent solution to form a liquid solvent film. An additional amount of the solvent solution is added to form a solvent puddle on the liquid solvent film. Photoresist is dispensed onto the solvent puddle for a sufficient time and in a sufficient amount to allow diffusion of the photoresist and the solvent puddle into the openings defined in the topography of the substrate. The solvent solution in and on the surface of the openings defined in the substrate from the pre-wetting step is replaced with the photoresist by facilitating diffusion of the photoresist into the topography openings. A photoresist layer is then cast in a predetermined thickness on the surface of the substrate.