The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
May. 22, 1998
Seiji Tai, Hitachi, JP;
Yoshiyuki Horibe, Hitachi, JP;
Hiroyuki Tanaka, Mito, JP;
Takeshi Nojiri, Ibaraki-ken, JP;
Kazuya Satou, Hitachi, JP;
Naoki Kimura, Hitachi, JP;
Mariko Shimamura, Hitachi, JP;
Hitachi Chemical Co., Ltd., Tokyo, JP;
Abstract
A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process whichh comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor, for forming a pattern; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development, to form the pattern; and (IV) calcining the pattern to remove an unnecessary portion, to form the phosphor pattern. Also provided ar this process for forming the phosphor pattern, a photosensitive element for a FED and a field emission display panel. In forming the layer on the substrate, the photosensitive resin composition layer can be provided as a layer of a photosensitive element, and the element provided on the substrate such that the layer contacts the substrate.