The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Sep. 22, 1999
Nathaniel C. Anderson, Pine Island, MN (US);
Robert D. Ahmann, Rochester, MN (US);
Pemstar, Inc., Rochester, MN (US);
Abstract
The present invention involves a photolithographic process, and apparatus and material for use therein, for producing etched or eroded areas or holes in a selected pattern on or in the surface of fine workpieces, such as small diameter tubes. One aspect of the present invention is a photolithographic process for producing a selected pattern on a nonplanar surface of a workpiece using at least one mask to define the selected pattern. The process includes the acts of applying a photoresist material to the workpiece and aligning the mask with the nonplanar surface of the workpiece. The mask may have an inner surface that corresponds to the nonplanar surface. The process may also include the acts of exposing and developing the photoresist material.