The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Oct. 06, 2000
Byung Chul Lee, Kyungg-Do, KR;
ANAM Semiconductor, Inc., , KR;
Abstract
A photomask for use in a photolithography technique includes a transparent portion for transmitting light from a light source, an opaque portion coated with an opaque material for interrupting the light from the light source, and a border portion positioned between the transparent and the opaque portions. The border portion includes a number of patterned structures coated with the opaque material and arranged along an edge of the opaque portion, wherein the amount of light passing through the border portion is gradually increased when moving from a first border line between the opaque and the border portions to a second border line between the border and the transparent portions.