The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2002

Filed:

Jun. 23, 2000
Applicant:
Inventors:

Isak I. Beilis, Lod, IL;

Raymond L Boxman, Herzliya, IL;

Samuel Goldsmith, Herzliya, IL;

Michael Keidar, Oak Park, MI (US);

Hanan Rosenthal, Tel-Aviv, IL;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract

A process and apparatus for depositing thin films and coatings using a vacuum arc plasma source having hot, non-consumable anode is described. Plasma and macroparticles of the cathode material are emitted from the cathode. Part of this material arrives at the hot refractory anode, where it is re-evaporated without macroparticle generation. Substrates exposed to the vapor flow from the anode, but shielded from a direct line of sight with the cathode, are coated with cathode material without macroparticle inclusions.


Find Patent Forward Citations

Beilis, Isak. (2002). Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode (U.S. Patent No. 6391164). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6391164

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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