The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2002

Filed:

Nov. 17, 2000
Applicant:
Inventors:

Egmont Rohwer, Lynnrodene, ZA;

Ralf Zimmermann, Munich, DE;

Hans Jörg Heger, Munich, DE;

Ralph Dorfner, Munich, DE;

Ulrich Boesl, Landshut, DE;

Antonius Kettrup, Ansberg, DE;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 3/02 ; B01F 5/04 ;
U.S. Cl.
CPC ...
B01F 3/02 ; B01F 5/04 ;
Abstract

In a method for producing a directed gas jet wherein a guided sample gas beam is generated and an auxiliary gas beam is generated and directed and guided in the same direction as, but separated from, the sample gas beam, a pulsed carrier gas stream is generated and combined with the sample gas beam such that the sample gas beam is separated into spaced pulses which are embedded between the axially spaced pulses of the carrier gas beam and the carrier gas beam with the sample gas beam embedded therein is combined with the auxiliary gas beam such that the carrier and sample gas beam is radially enveloped by the auxiliary gas beam to from the directed gas jet of a carrier and sample gas pulses enveloped in the auxiliary gas beam.


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