The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Aug. 20, 1998
Applicant:
Inventors:
Danny Kenny, Sherman, TX (US);
Keith Lindberg, Sherman, TX (US);
Assignee:
GlobiTech Incorporated, Sherman, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 ;
U.S. Cl.
CPC ...
G06F 7/00 ;
Abstract
A system and method for monitoring a process flow of a semiconductor wafer. In one embodiment, the method initially calculates a first location of the wafer before it is processed. The wafer is then moved into a process chamber where it is processed. Then a second location of the wafer is calculated before the wafer is unloaded. If the difference between the first and second locations are within a predetermined amount, the wafer is unloaded and regular processing steps proceed. If the difference is not within the predetermined amount, an alarm is activated and the process is stopped.