The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Apr. 26, 2000
Calum E. MacAulay, Vancouver, CA;
Digital Optical Imaging Corporation, Bellingham, WA (US);
Abstract
Apparatus and methods that improve the depth resolution of confocal microscopy images using out-of-focus information from within the focal plane of interest (from the x-y direction) and/or from planes above and below the focal plane of interest (from the z-direction). The interaction of (a) a reflective surface or other light-emanating material and (b) the PSF formed by a confocal microscope results in “out-of-focus” information in, above and below the focal plane; this “out-of-focus” information can be measured. Comparing the measurements in the x-y plane, preferably at a plurality of z-positions, can improve the resolution along each of the x, y, and z-axes, increase the number of the photons used in the system, thus improving the signal to noise ratio, and help correct for aberrations, such as spherical aberrations or other optical aberrations, in the optical system of a microscope.