The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Oct. 22, 1998
Applicant:
Inventor:
Paul Raphael Resnick, Cary, NC (US);
Assignee:
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 2/336 ; C07C / ;
U.S. Cl.
CPC ...
B01J 2/336 ; C07C / ;
Abstract
A good yield, high reaction rate process is disclosed for the production of perfluoro(alkyl vinyl ethers). The process involves elimination of halogen, preferably chlorine, from carbon atoms &agr; and &bgr; to an ether oxygen in an &agr;,&bgr;-dihaloperfluoro ether wherein the &agr;,&bgr;-dihaloperfluoro ether is allowed to react with zero valent zinc in a pyrrolidinone solvent. More particularly, the inventive process relates to high yield production of CF ═CFOCF CF SO F from CF ClCFClOCF CF SO F wherein CF ClCFClOCF CF SO F is allowed to react with zero valent zinc in the presence of N-methyl-2-pyrrolidinone.