The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Sep. 21, 2000
Applicant:
Inventors:
Neal T. Murphy, Richardson, TX (US);
Claire Ching-Shan Jung, Plano, TX (US);
Danny F. Mathews, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; H01L 2/1461 ;
U.S. Cl.
CPC ...
B44C 1/22 ; H01L 2/1461 ;
Abstract
A method and apparatus for resist strip. Wafers ( ) with a patterned resist formed thereon are placed in a carrier ( ) in a process chamber ( ). An ozonated deionized water mist ( ) is sprayed on the surface of wafer ( ). The ozonated deionized water mist ( ) strips the resist and removes the resist residue without the use of hazardous chemicals. The ozonated deionized water mist ( ) may be formed in an atomizer that mixes deionized water ( ) with ozone ( ). The ozonated deionized water mist ( ) is then sprayed onto the wafers ( ) while the wafers are being rotated.