The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Jan. 26, 1999
Applicant:
Inventor:
Takeshi Sampei, Hino, JP;
Assignee:
Konica Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/498 ;
U.S. Cl.
CPC ...
G03C 1/498 ;
Abstract
A processing method which thermally develops a thermally developable photosensitive material which is exposed imagewise, comprising the step of thermally developing said thermally developable photosensitive material using heating element which intermittently heats and has duration time of surface temperature of not less than 250° C. to be not more than 1 second, wherein said thermally developable photosensitive material comprising a support having thereon one layer or plural layers; containing organic silver salt, photosensitive silver halide grains and a reducing agent.