The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2002

Filed:

Oct. 23, 2000
Applicant:
Inventors:

Wei-Hsiang Wang, Hisnchu, TW;

Min-Hui Huang, Taichung, TW;

Assignee:

Ritek Corporation, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 ;
U.S. Cl.
CPC ...
B32B 3/02 ;
Abstract

An optical recording medium structure and its method of manufacture. The optical recording medium structure includes, from bottom to top, a transparent substrate, a first dielectric layer, a first buffer layer, a recording layer, a second buffer layer, a second dielectric layer, an optical compensation layer and a reflection layer. The optical recording medium structure is manufactured by forming the first dielectric layer, the first buffer layer, the recording layer, the second buffer layer, the second dielectric layer, the optical compensation layer and the reflection layer in sequence over the transparent substrate. The first buffer layer and the second buffer layer serves to prevent the diffusion of at least one element from the recording layer into the first and the second dielectric layer and vice versa. The optical compensation layer enhances thermal sensitivity of the recording layer during an optical read/write operation.


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