The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Mar. 13, 2000
Stéphane Sarrade, Montpellier, FR;
Luc Schrive, Pont Saint Esprit, FR;
Christian Guizard, Montpellier, FR;
Anne Julbe, Montpellier, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
This invention relates to a method of manufacturing a product based on a simple or mixed metal oxide, or silicon oxide, from a charge of one or more precursors comprising one or more organic precursors. These oxides can be, for example, oxides of Ti, Al, Mg, Th, Si, Ba, Bc or Zr etc. The method comprises bringing the charge of organo-metallic precursors into contact with a reaction medium that comprises supercritical C0 , at a temperature of from 31 to 100° C. and a supercritical pressure of from 3×10 to 5×10 Pa, in order to form from the precursor, a product based on a simple or mixed metal oxide, or silicon oxide, from the reaction medium by reducing the pressure of the supercritical C0 to a pressure lower than the supercritical pressure.