The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2002

Filed:

May. 04, 2001
Applicant:
Inventors:

Nobukazu Ikeda, Osaka, JP;

Akihiro Morimoto, Osaka, JP;

Yukio Minami, Osaka, JP;

Teruo Honiden, Osaka, JP;

Kouji Kawada, Osaka, JP;

Katunori Komehana, Osaka, JP;

Touru Hirai, Osaka, JP;

Michio Yamaji, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F17D 3/14 ;
U.S. Cl.
CPC ...
F17D 3/14 ;
Abstract

A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.


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