The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2002

Filed:

May. 04, 2001
Applicant:
Inventors:

Benjamin J. Eggleton, Summit, NJ (US);

Kenneth S. Feder, Murray Hill, NJ (US);

Mikhail Sumetskiy, Bridgewater, NJ (US);

Assignee:

Lucent Technolgies Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 ; G02B 7/182 ;
U.S. Cl.
CPC ...
G02B 5/08 ; G02B 7/182 ;
Abstract

A reflecting apparatus includes a flexible mirror and at least one rocker arm coupling an applied force to a plurality of spaced-apart locations on the mirror to adjust the shape of the mirror. The reflecting apparatus may be used in an interferometer in the path of one of the interfering beams, and adjustments of the shape of the mirror may be used to control the interference pattern generated. The interference pattern created by the apparatus may be used to create fiber Bragg gratings and phase masks, including chirped gratings and masks. An interferometer may use such a reflecting apparatus in the path of each interfering beam.


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