The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2002

Filed:

Dec. 15, 1999
Applicant:
Inventors:

Marc Andrieux, Saint Germain en Laye, FR;

Fernande Lafonta, Paris, FR;

Didier Riehl, Montrouge, FR;

Laurent Vivien, Paris, FR;

Eric Anglaret, Montpellier, FR;

Patrick Bernier, Castries, FR;

Monique Brunet, Montpellier, FR;

Christophe Goze, Cournonterral, FR;

Catherine Journet, La Seyne sur Mer, FR;

François Hache, Villejuif, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/29 ; G02F 1/03 ; H01J 4/014 ; G01N 2/100 ;
U.S. Cl.
CPC ...
G02F 1/29 ; G02F 1/03 ; H01J 4/014 ; G01N 2/100 ;
Abstract

The invention relates in particular, to the area of devices or systems whose optical operation is modified by changing the optical properties of the medium of which they are formed and that are intended, in particular, for limiting the luminous intensity transmitted by the system. Specifically, the invention relates to a device for selectively limiting the intensity of a radiation, including a liquid or solid medium containing nanotubes, for example, nanotubes made of carbon or boron, tungsten, silicon, or composite nanostructures, such as BN, BC3, BC2N, CN(C3N4), or MoS2.


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