The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2002
Filed:
Nov. 12, 1998
Munechika Tani, Fukaya, JP;
Takashi Murai, Fukaya, JP;
Ichiro Saotome, Urawa, JP;
Masatsugu Inoue, Kumagaya, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A main body of a shadow mask is opposed to a phosphor screen and is formed in a substantially rectangular shape. The main body has a main surface portion where a number of electron beam apertures are formed, and a skirt portion provided around the main surface portion with a non-aperture portion interposed between the skirt portion and the main surface portion. A plurality of rectangular openings extending in the long axis direction (or X-direction) of the mask body are formed at the skirt portion. Concave portions extending in the long axis direction (X-direction) of the mask body are formed at the non-aperture portion. The openings and concave portions are provided within a range of about ¼ of the length W of the mask body in the long axis direction, with respect to a center of the range defined at a position distant from the short axis Y by about ⅓ of the length W of the long axis direction of the mask body.