The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2002
Filed:
Sep. 15, 2000
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
An apparatus for forming a thin film using microwave and a method therefor are provided. The apparatus for forming a thin film on a wafer by densifying predetermined soot on a wafer, when the wafer and the soot form a sample, includes a microwave sintering furnace for sealing the sample and exposing the sample to microwave, thus sintering the sample, a sintering furnace atmosphere maker for controlling the state, being the atmosphere of air inside the microwave sintering furnace, a temperature sensor/controller for sensing a temperature inside the microwave sintering furnace, comparing the temperature with a predetermined reference temperature, and outputting an error temperature, and a microwave power source for generating microwave of a predetermined temperature with reference to the error temperature output from the temperature sensor/controller and applying the microwave to the microwave sintering furnace. It is possible to rapidly form a film of a fine and uniform structure by densification using microwave.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile