The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2002
Filed:
Aug. 25, 2000
Yaw-Ting Wu, Taoyuan County, TW;
Chun-Hsiang Wen, Hsinchu, TW;
Shu-Huei Cheng, Hsinchu, TW;
Ming-Hsiang Chan, Hsinchu County, TW;
Jun-Ichi Yasukawa, Kanagawa Pref., JP;
Hajime Kuwahara, Chiba Pref., JP;
Abstract
A method of manufacturing a color filter for a reflective liquid crystal display is disclosed. The method comprises the following steps: 1) coating a layer of positive photoresist on a reflective layer or reflective substrate, and exposing the photoresist layer to a light via a mask having a fine pixel pattern so as to form at least three exposed regions of different exposed energy in the photoresist layer, 2) Removing one of the existing exposed regions having a largest exposed dose by the use of an alkaline developer solution so as to expose the surface of the electrically conductive reflective substrate corresponding to the removed region; and electrodepositing a color paint on the exposed surface of the reflective substrate to form a color filter layer of one selected color, 3) repeating step 2) to remove the other exposed regions in the photoresist layer and proceeding with an electrodeposition process with another color paint until a color filter layer of all desired colors is completed. Thus, a color filter for a reflective crystal display according to the present method could obtain a uniform thickness, a better flatness, and a pattern of high fineness and have a large degree of freedom in pattern arrangement and the possibility of increased size.