The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2002
Filed:
Feb. 16, 2001
Applicant:
Inventors:
Haruo Kawashima, Tokyo, JP;
Taro Fujima, Tokyo, JP;
Assignee:
Tabata Co., Ltd, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 9/02 ;
U.S. Cl.
CPC ...
A61F 9/02 ;
Abstract
A face mask for diving includes a pair of front lenses and a nose cover formed by a portion of a skirt between these lenses. Proximal ends of the nose cover and a portion of the skirt being contiguous to these proximal ends are curved along the lens frame with the lenses held therein closely in contact with an inner peripheral surface and an inner surface of the lens frame.