The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2002
Filed:
Sep. 29, 2000
Joseph A. Swift, Ontario, NY (US);
T. Edwin Freeman, Webster, NY (US);
Theodore Lovallo, Williamson, NY (US);
Edward L. Schlueter, Jr., Rochester, NY (US);
Constance J. Thornton, Ontario, NY (US);
Xiaoying Elizabeth Yuan, Fairport, NY (US);
Santokh S. Badesha, Pittsford, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Seamed belts, particularly puzzle-cut imageable seam intermediate transfer belts, that have large seam surface areas and puzzle-cut tabs that are resistant to lifting away from the seam. Belts include a substrate having a puzzle-cut first end and a puzzle-cut second end that are interlocked together to form a seam having a kerf. The first end includes a first step and the second end includes a second step. When the ends are interlocked the first step and the second step form a channel. An adhesive is disposed in the channel. The resulting channel beneficially continuously extends along the puzzle-cut seam. When the belt is an imageable seam intermediate transfer belt the substrate takes the form of a semiconductive substrate. Such imageable seam intermediate transfer belts find use in electrophotographic marking machines.