The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2002

Filed:

Sep. 16, 2000
Applicant:
Inventors:

Yukihiro Yoneda, Himeji, JP;

Fumio Shibusawa, Ibo-gun, JP;

Yasuhiro Shingai, Himeji, JP;

Masatoshi Ueoka, Himeji, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 6/726 ; C07C 6/748 ; C07C 6/952 ;
U.S. Cl.
CPC ...
C07C 6/726 ; C07C 6/748 ; C07C 6/952 ;
Abstract

The present invention provides: a purification process for hydroxyalkyl (meth)acrylate that suppresses forming by-products such as a diester and a dimer of acrylic acid in the distillation process, and can ensure a purity of hydroxyalkyl (meth)acrylate, and can operate stably without causing troubles such as polymerization. In a purification process for hydroxyalkyl (meth)acrylate which is obtained by reacting (meth)acrylic acid and alkylene oxide in the presence of a catalyst, and removing unreacted alkylene oxide and/or (meth)acrylic acid in a reaction solution after the reaction, a distillation apparatus having a portion of a vacant column and a thin-film evaporation apparatus are used at the same time.


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