The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2002
Filed:
Dec. 27, 2000
Applicant:
Inventors:
Mao-Ching Fang, Hsinchu, TW;
Ming-Chia Tai, Hsinchu Hsien, TW;
Jui-Fa Chang, Hsinchu, TW;
Ting-Chun Liu, Hsinchu, TW;
Tzu-Yu Lin, Hsinchu Hsien, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract
The present invention relates to a silicon-containing vinyl copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit with an acid-labile group, and a vinyl repeating unit with a silicon-containing group. The silicon-containing vinyl copolymer is suitable for use as a top layer resist in a bilayer resist system.