The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2002
Filed:
Jan. 14, 2000
Waltraud Werdecker, Hanau, DE;
Heinz Fabian, Grossostheim, DE;
Udo Gertig, Johannesberg, DE;
Johann Leist, Altenstadt, DE;
Rolf Göbel, Gelnhausen, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO granulate to be used is a SiO granulate ( ) composed of at least partially porous agglomerates of SiO primary particles, with a specific BET surface ranging from 1.5 m /g to 40 m /g and an apparent density of at least 0.8 g/cm . A SiO granulate ( ) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO primary particles and in that it has a specific BET surface ranging from 1.5 m /g to 40 m /g and an apparent density of at least 0.6 g/cm .