The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Jul. 29, 1998
Mark H. Etzel, Harvard, MA (US);
Robert John Frank, Silver Spring, MD (US);
Daniel Nelson Heer, Newton, NH (US);
Robert Joseph McNelis, Columbia, MD (US);
Semyon B. Mizikovsky, Morganville, NJ (US);
Robert John Rance, Andover, MA (US);
R. Dale Shipp, Columbia, MD (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
Methods and apparatus for enhanced CMEA, or ECMEA, processing. A forward ECMEA and a reverse ECMEA process are provided. The forward ECMEA process decrypts text encrypted by the reverse ECMEA process and the reverse ECMEA process decrypts text encrypted by the forward ECMEA process. The forward ECMEA process employs a transformation, an iteration of the CMEA process, and an inverse transformation. The reverse ECMEA process employs a reverse transformation, an iteration of the CMEA process, and a reverse inverse transformation. The transformations and inverse transformations, and the iteration of the CMEA process, employ secret offsets to improve security. The transformations and the iteration of the CMEA process also employ an enhanced tbox function using an involutary lookup table.