The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Aug. 04, 1999
Takashi Saito, Osaka, JP;
Matsushia Electric Industrial Co., Ltd., Osaka, JP;
Abstract
With a substrate stage and a mask stage continuously moved in the −Y direction, a circuit pattern is exposed to a shaped beam until the shaped beam reaches an upper left area from a lower left area, thereby obtaining a partial exposure area. Then, after the shaped beam reaches the upper left area of the circuit pattern, the substrate stage and the mask stage are shifted in the −X direction by a pitch P. Next, the substrate stage and the mask stage are continuously moved in the +Y direction until the shaped beam reaches a lower end portion from an upper end portion of the circuit pattern. In this case, the shaped beam is shaped so that an exposure dose in a double exposure portion and an exposure dose in a non-double exposure portion in the partial exposure area can be equal to each other.