The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Aug. 25, 1998
Yasuhiro Shimada, Hadano, JP;
Takeo Yamazaki, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection having a micro-aperture on the tip is formed. Firstly, a projection or a dent is formed on a substrate. Then, a film is formed on the surface of the projection or of the opposite side of the dent so as to make the film thin at and near the tip of the projection or the dent. The film is subsequently etched to expose the tip, which is further etched to produce a micro-aperture. Preferably, the film is formed of a thermo-plastic material such as glass, especially phospho-silicate glass to produce a viscous flow under heated conditions. The probe having a micro-aperture can be used for a surface scanner, an aligner or an information processor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile