The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2002

Filed:

Aug. 02, 2000
Applicant:
Inventors:

Charles Leu, Fremont, CA (US);

Lin Huang, San Jose, CA (US);

Qixu David Chen, Milpitas, CA (US);

Rajiv Yadav Ranjan, San Jose, CA (US);

Assignee:

Seagate Technology LLC., Scotts Valley, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/66 ;
U.S. Cl.
CPC ...
G11B 5/66 ;
Abstract

Sputter-deposited TiW film interposed between a magnetic layer and a nitrogen-containing overcoat of a magnetic recording medium significantly reduces the migration of nitrogen from the overcoat to the magnetic layer, thereby improving the magnetic recording performances of the magnetic recording medium.


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