The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Aug. 24, 1999
Applicant:
Inventors:
Douglas H. Pearson, Laurel, MD (US);
Ronald J. Tonucci, Waldorf, MD (US);
Assignee:
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 ;
U.S. Cl.
CPC ...
B32B 3/10 ;
Abstract
The present invention is a process for making a nanochannel glass (NCG) replica, having the steps of: coating a face of an etched NCG with a replica material (with or without an intervening buffer layer), where the etched NCG face has a plurality of channels arranged in a desired pattern, to form a replica coating on the NCG conforming to the pattern; and removing the replica coating from the etched NCG. The present invention is also the replica made by this process.