The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Jul. 24, 2000
Tetra Laval Holdings & Finance S.A., Pully, CH;
Abstract
The described device is introduced into a plastic container with a narrow opening and serves a plasma enhanced process for treating the inside surface of the container. The device ( ) extends between the container opening and the container bottom along the container axis (X) and comprising a gas feed tube ( ) for feeding a process gas into the container and permanent magnets ( ) for establishing a stationary magnetic field inside the container. The magnets ( ) form a column of superimposed magnets which is arranged inside the gas feed tube ( ). The north and south poles of each magnet are positioned on opposite sides of the container axis (X). The device may also comprise cooling means ( ) for cooling the gas feed tube and the magnets. Preferably the plasma used in the plasma enhanced process is sustained by microwaves or radio frequency waves and the magnets ( ) are preferably designed such that electron-cyclotron-resonance conditions are established in an area distanced from the container inner surface by 0 to 30 mm.