The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Nov. 17, 1999
Applicant:
Inventors:
Nick J. Visovsky, Corning, NY (US);
David D. Wang, Painted Post, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 1/100 ;
U.S. Cl.
CPC ...
B29D 1/100 ;
Abstract
A method of replicating a nanoscale pattern which comprises forming the pattern on the outer surface of a cylindrical roller, providing a surface upon which the pattern is to be replicated, and transferring the nanoscale pattern from the cylindrical roller onto the surface to provide at least one replication of the pattern on that surface. The roller is adapted to carry the pattern on its outer surface and transfer the pattern to a substrate. The ultimate product may be a grating polarizer.