The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Feb. 12, 2001
Wilmert De Bosscher, Drongen, BE;
Hugo Lievens, Gent, BE;
Sinvaco N.V., Zulte, BE;
Abstract
A sputtering magnetron with a rotating cylindrical target and a stationary magnet assembly ( *) is described, the magnet assembly ( *) being adapted to produce an elongate plasma race-track on the surface of the target, the elongate race-track having substantially parallel tracks over a substantial portion of its length and being closed at each end by end portions ( ′), wherein the spacing between the tracks of the race-track is increased locally to materially effect sputtering onto a substrate. The increase in spacing may be at the end portions or along the parallel track portion. The increase in spacing may provide more even erosion of the target beneath the end portions of the race-track, and provide more even coatings on the substrate.