The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
Feb. 16, 2001
Keun-Deok Park, Busan-kwangyeok-shi, KR;
Samsung Electronics Co., Ltd., Kyungki-Do, KR;
Abstract
A fabrication method of graded index silica glass is disclosed. The method according to the present invention includes the steps of dispersing to form sol by mixing a starting material with a dispersion medium; molding the sol into a moisturized gel with a predetermined shape using a molding frame and separating the moisturized gel from the molding frame; drying the moisturized gel under a predetermined temperature and humidity level to remove the dispersion medium and to form a first dry gel having a predetermined moisture content distribution, hydrolyzing the moisture remained in the first dry gel and an additive solution by putting the first dry gel into the additive solution; re-drying the first dry gel, which underwent said hydrolysis, to form a second dry gel; and, thermal processing the second dry gel by supplying reaction gas thereto, removing impurities therefrom and annealing for isolation.