The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
May. 25, 1999
Dominique Dion, Houston, TX (US);
Mark T. Frey, Sugar Land, TX (US);
James Stephen Hall, Houston, TX (US);
Qiming Li, Sugar Land, TX (US);
Richard A. Rosthal, Houston, TX (US);
Mark A. Fredette, Houston, TX (US);
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
The present invention describes a method and apparatus to control the effect of contact impedance on a formation resistivity measurement during a logging-while-drilling operation. The control of contact impedance is accomplished by maintaining a substantially zero difference in potential between two monitor electrodes positioned on the resistivity logging tool near a current electrode. The tool can employ a ring electrode configuration and/or a button electrode, configuration. The ring electrode configuration incorporates two pairs of ring monitor electrodes on each side of a ring current electrode. The button electrode configuration incorporates. a monitor electrode, surrounded by a current electrode, surrounded by a second monitor electrode. Insulation gaps are positioned between each electrode to separate the electrodes. A variable current is supplied to the current electrode in each configuration to maintain the same potential at each monitor electrode. The effect of contact impedance is controlled through maintaining the same potential at each monitor electrode.