The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Nov. 28, 2000
Wataru Yamada, Hadano, JP;
Katsumi Nukada, Odawara, JP;
Rie Ishii, Atsugi, JP;
Mieko Seki, Odawara, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
The present invention relates to a manufacturing method of an electronic device comprising the steps of: preparing at least two kinds of hydrolytic silicon compounds that are different in reactivity to water; preparing a protective group precursor having a substituent having a reactivity to water equal or substantially equal to the reactivity of a reactive group of one of the hydrolytic silicon compounds to water; exchanging a reactive group of the other hydrolytic silicon compound with the substituent of the protective group precursor; preparing a silicon-containing coating agent containing the one of the hydrolytic silicon compounds and a hydrolytic silicon compound having the reactive group which has been exchanged with the substituent of the protective group precursor; and coating and curing the silicon-containing coating agent on a base plate so that at least one layer of a cured film is formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile