The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Sep. 25, 2000
John Charles Wolfe, Houston, TX (US);
Paul Ruchhoeft, The Woodlands, TX (US);
The University of Houston, Houston, TX (US);
Abstract
For lithographic patterning a plurality of identical structures ( ) onto a target substrate ( ), a template mask ( ) is produced which bears a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one structure element (C) of circular shape. Starting from a primary mask ( ) bearing a primary structure pattern consisting of at least one structure element having a circular shape, the production of the template mask is done in at least one lithographic mask structuring step (b, c) wherein in each mask structuring step by means of a broad beam ( ) of energetic radiation the mask is illuminated and a structure pattern on the mask ( ) is imaged onto an intermediate substrate ( ); in these mask structuring steps the pattern image imaged from the structure pattern is moved over the intermediate substrate to a number of different locations. From the intermediate substrate ( ) thus patterned another mask ( ) having a structure pattern corresponding to the pattern image is produced, respectively. The mask produced from the last of said mask structuring steps is the template mask ( ). By means of the template mask ( ) a target substrate ( ) is patterned in a final lithographic patterning step, the pattern image thus produced comprising a plurality of identical target structures ( ).