The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Jul. 21, 2000
Daniel Richard Marantz, Port Washington, NY (US);
Keith Alan Kowalsky, East Norwich, NY (US);
David James Cook, Farmington Hills, MI (US);
Larry Gerald Gargol, Ann Arbor, MI (US);
Ford Global Technologies, Inc., Dearborn, MI (US);
Abstract
Method of thermally depositing metal at increased rates onto a target surface, comprising: establishing and operating a high velocity plasma transferred wire arc between a cathode and the free-end of a consumable wire electrode, the energy of such plasma and arc being sufficient to not only melt and atomize the free-end of the wire into metal particles, but also project the particles as a column onto the target surface at an enhanced deposition rate for continuous periods in excess of 50 hours; surrounding the plasma and arc with high velocity and high flow gas streams that converge beyond the intersection of the wire free-end with the plasma-arc to limit turbulence of the plasma-arc, avoid direct impingement with the wire and assist the projection of the particles to the target surface; and impinging a low velocity gas flow along the axis of the advancing wire to counteract any destabilizing fluid dynamic forces attempting to move melted particles back along the wire away from the wire free end.