The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2002

Filed:

May. 24, 2000
Applicant:
Inventors:

Marc Ledoux, Strasbourg, FR;

Jean Nougayrede, Strasbourg, FR;

Cuong Pham-Huu, Saverne, FR;

Nicolas Keller, Strasbourg, FR;

Sabine Savin-Poncet, Buros, FR;

Claude Crouzet, Strasbourg, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 1/704 ;
U.S. Cl.
CPC ...
C01B 1/704 ;
Abstract

A process for catalytically oxidizing H S contained in a gas directly to sulphur containing the following steps: combining the H S-containing gas with a gas containing free oxygen in an amount to produce an oxygen-enriched H S-containing gas having O /H S molar ratio ranging from about 0.05 to about 15; and contacting the oxygen-enriched H S-containing gas with a catalyst for selective oxidation of H S to sulphur, wherein the catalyst includes a catalytically active phase combined with a silicon carbide-based support and wherein the active phase of the catalyst consists of at least one oxysulphide of at least one metal selected from the group consisting of iron, copper, nickel, cobalt, chromium, molybdenum and tungsten, at a temperature above the dew point of sulphur formed during H S oxidation.


Find Patent Forward Citations

Ledoux, Marc. (2002). Process for oxidizing the h2s contained at low concentration in a gas directly to sulphur by catalytic means and in the vapour pause (U.S. Patent No. 6372193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6372193

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…